Overview
Overview
The EllipsoStep system is the fastest imaging ellipsometer available. EllipsoStep can measure a full resolution ellipsometric image (Psi, Delta, Intensity) in under 4 seconds. Specially designed optical components allow the EllipsoStep system to measure samples using an extended wavelength range from 250nm to 1000nm.
Unlike conventional nulling ellipsometric imagers which are significantly slower and require interpolation algorithms to measure a complete image, the EllipsoStep can quickly and directly measure the ellipsometric properties of a sample on a pixel-by-pixel basis.
The EllipsoStep imaging ellipsometer system can perform measurements with a lateral resolution smaller than 1 um, which is 50 times smaller than even the most advanced conventional ellipsometers using micro-spot technology.
Using a wide array of optical accessories, the EllipsoStep system allows the user to view microscopic images of samples in real-time, and when used in conjunction with Axometrics’ advanced analysis properties, measure properties like thin film thickness and refractive index. And like the all other Axometrics measurement systems, , the EllipsoStep also includes a wide range of available desktop, large, and production measurement fixtures.
Applications
Applications
The EllipsoStep system allow point by point ellipsometric mapping able to measure thickness an refractive index properties of a wide array of thin film applications. Including
Semiconductors: Ellipsometry is the current industry standard for semiconductor measurement. By adding the ability of microscopic imaging users can better refine their manufacturing processes.
LCD/OLED Displays: Both LCD and OLED displays use thin film deposition technology. Axometrics can currently leverage our experience in display technology and apply it to these parts of the manufacturing process.
Polymers: Polymer films are currently being used in thin film structures in the display industry, and can be characterized using EllipsoStep.
Solar Cells: Alternative energy is an extremely large emerging market, and Ellipsometry is a key tool in the development of next generation Solar Cells.
Graphene: Interest in the emerging technology of 2D materials like graphene is extremely high. Imaging ellipsometry is an invaluable tool in characterizing new processes for these rapidly developing technologies.
Examples
Example Measurements
The EllipsoStep software provides a convenient interface for measuring and analyzing patterned samples. Once the measurement has been completed, the operator can go back and test different areas within the image. The example below shows a line scan crossing two different regions: one with 95 nm of SiO2 on Si, and one with native oxide on Si.
The example below shows the coating thickness roll-off at the corner of a shadow mask used on a large sputtering machine near the edges of the substrate. Either 2D surface plots or 1D line scans can be calculated. Even if the thickness varies by multiple retardance orders within the image, the EllipsoStep can determine the correct film thickness at any location within the image.
With its 1 μm spatial resolution, EllipsoStep can make direct measurements of surface roughness or thickness uniformity.
It is also possible to measure multiple regions within a test element group (TEG) at the same time. Pattern matching routines can automatically identify the elements within the image and automatically apply the correct ellipsometric recipe to each region.
Contact Axometrics to discuss your application or to provide samples for demonstration measurements.
Models
Models
| ISE-UV-VIS-NIR |
| wavelength range |
250nm-1000nm |
| sensor size |
1200 x 1200 |
| dynamic range |
16 bit |
Specifications
Specifications
| ISE-UV-VIS-NIR |
| Design |
Rotating Compensator Ellipsometer |
| Detector Type |
CMOS Camera (16 bit) |
| Max Resolution |
1200 x 1200 |
| Sensor Size |
13.2mm x 13.2mm |
| TEC Cooling |
Yes |
| Measurement Time |
2.4 sec |
| Wavelength Range |
250nm-1000nm |
| Thickness Repeatability (3σ) |
0.3nm |
| Refractive Index Repeatability (3σ) |
0.001 |
United States